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10 AND 20 CM LEDGE THICKNESS

Figure 20 shows the metal pad current density field when the ledge thickness is
increased to 10 cm. The resulting metal pad and cell voltage oscillation and Fourier
power spectra of the non-linear cell stability analysis results are presented in Figure 21.

In order to save some CPU time, the non-linear stability analysis was carried out
only up to 250 seconds instead of 1000 seconds for the base case analysis. For that
reason, it is not so easy to compare the results obtained. Nevertheless, it seems that by
increasing the ledge thickness from 4 cm to 10 cm, the cell is predicted to be a bit more
stable which is consistent with the slight decrease of the intensity of the horizontal
current in the metal pad. It is interesting to notice that in modern cell design, such a
reduction of horizontal current intensity and cell stability improvement is achieved by not
rodding the collector bar up to the edge of the cathode block.

Yet, as we can see in Figures 22 and 23, this tendency is reversing fast as the case
with 20 cm ledge thickness is predicted to be less stable than the case with 10 cm ledge
thickness.
Figure 20: MHD-Valdis model metal pad current density field solution